Structure, hardness and thermal stability of nanolayered TiN/CrN multilayer coatings

Barshilia, Harish C and Rajam, KS and Jain, Anjana (2003) Structure, hardness and thermal stability of nanolayered TiN/CrN multilayer coatings. Vacuum, 72 (3). pp. 241-248.

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Nanolayered TiN/CrN multilayer coatings were deposited on silicon substrates using a reactive DC magnetron sputtering process at various modulation wavelengths (?), substrate biases (VB) and substrate temperatures (TS). X-ray diffraction (XRD), nanoindentation and atomic force microscopy (AFM) were used to characterize the coatings. The XRD confirmed the formation of superlattice structure at low modulation wavelengths. The maximum hardness of the TiN/CrN multilayers was 3800kg/mm2 at ?=80 A?, VB=-150V and T S=400xB0;C. Thermal stability of TiN, CrN and TiN/CrN multilayer coatings was studied by heating the coatings in air in the temperature range (TA) of 400-800xB0;C. The XRD data revealed that TiN/CrN multilayers retained superlattice structure even up to 700xB0;C and oxides were detected only after TAamp;gt;750xB0;C, whereas for single layer TiN and CrN coatings oxides were detected even at 550xB0;C and 600xB0;C, respectively. Nanoindentation measurements showed that TiN/CrN multilayers retained a hardness of 2800kg/mm2 upon annealing at 700xB0;C, and this decrease in the hardness was attributed to interdiffusion at the interfaces. xA9; 2003 Elsevier Ltd. All rights reserved.

Item Type: Article
Uncontrolled Keywords: Nanoindentation; Reactive DC magnetron sputtering; Thermal stability; TiN/CrN multilayers; X-ray diffraction; Atomic force microscopy; Hardness; Magnetron sputtering; Multilayers; Nanostructured materials; Structure (composition); Substrates; Thermodynamic stability; X ray diffraction analysis; Multilayer coatings; Titanium nitride;
Subjects: CHEMISTRY AND MATERIALS > Chemistry and Materials (General)
Depositing User: Mr Vijaianand SK
Date Deposited: 20 Jan 2005
Last Modified: 24 May 2010 04:09

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