Reactive sputtering of hard nitride coatings using asymmetric-bipolar pulsed DC generator

Barshilia, Harish C and Rajam, KS (2006) Reactive sputtering of hard nitride coatings using asymmetric-bipolar pulsed DC generator. Surface and Coatings Technology, 201 (3-4). pp. 1827-1835. ISSN 0257-8972

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Hard coatings of TiN, CrN, TiAlN and Si3N4, which exhibit a large variation in their electrical resistivities, have been prepared in an unbalanced13; magnetron sputtering system using an asymmetric-bipolar pulsed DC generator. TiN, CrN and TiAlN coatings, which exhibit fairly low electrical13; resistivities as compared to Si3N4, have also been prepared using a DC generator in the same sputtering system under identical deposition conditions.13; The properties of these coatings are compared with the pulsed deposited coatings. X-ray diffraction, X-ray photoelectron spectroscopy,13; nanoindentation tester, atomic force microscopy and potentiodynamic polarization have been used to characterize the coatings.We present in detail13; the effect of pulsed sputtering onto the plasma properties (e.g., cathode voltage, cathode current and ion current) and onto the properties of the13; coatings (e.g., growth rate, surface roughness, hardness, porosity). Our studies show that a variety of hard nitride coatings (including dielectric) with13; superior properties and low defect density can be prepared using asymmetric-bipolar pulsed DC generator.13; xA9; 2006 Elsevier B.V. All rights reserved.

Item Type: Article
Additional Information: Copyright for this article belongs to Elsevier Science Ltd.
Uncontrolled Keywords: Asymmetric-bipolar pulsed DC generator;Reactive sputtering;Unbalanced magnetron;Hard coatings;Dielectric coatings
Subjects: CHEMISTRY AND MATERIALS > Composite Materials
Depositing User: Mrs Manoranjitha M D
Date Deposited: 29 Jan 2007
Last Modified: 07 May 2012 05:28

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