Fatigue Crack Growth Under Programmed Equivalent of FALSTAFF Spectrum

Mitchenko, EI and Prakash, Raghu V and Sunder, R (1992) Fatigue Crack Growth Under Programmed Equivalent of FALSTAFF Spectrum. Technical Report. National Aerospace Laboratories, Bangalore, India.

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Optical fractography was used to estimate small notch13; crack growth under programmed FALSTAFF loading in an13; Al-Cu alloy. It was able to handle crack sizes as low as 25 microns and growth rates Over two orders of magnitude. 13; Randomized Mini FALSTAFF load sequence was modified13; into a programmed load equivalent with major loads either13; preceeded or succeeded by marker loads. Crack growth rate13; under programmed FALSTAFF spectrum as estimated by optical13; fractography conformed to compliance based estimates on a13; SE (T) specimen. Long crack growth rates under programmed13; and randomized mini FALSTAFF spectrum were essentially13; similar. Spectrum load fatigue crack growth was studied13; in central hole coupons under notch inelastic conditions.13; Scatter in growth rates for small notch cracks was found13; to be of the same magnitude as that of long cracks.13; Multiple fatigue cracks are observed at the notch root,13; and they appear to influence each other.13; 13;

Item Type: Monograph (Technical Report)
Uncontrolled Keywords: Optical fractography;Spectrum and programmed loading;Crack growth;Fatigue striations.
Subjects: CHEMISTRY AND MATERIALS > Composite Materials
Depositing User: Mr. Ravikumar R
Date Deposited: 06 Jun 2006
Last Modified: 24 May 2010 04:13
URI: http://nal-ir.nal.res.in/id/eprint/1689

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