Reversible phase transition in vanadium oxide films sputtered on metal substrates

Palai, D and Carmel Mary Esther, A and Porwal, D and Pradeepkumar, MS and Raghavendra Kumar, D and Bera, Parthasarathi and Sridhara, N and Dey, A (2016) Reversible phase transition in vanadium oxide films sputtered on metal substrates. Philosophical Magazine Letters, 96 (11). pp. 440-446. ISSN 09500839

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Official URL: https://www.tandfonline.com/doi/pdf/10.1080/095008...

Abstract

Vanadium oxide films, deposited on aluminium (Al), titanium (Ti) and tantalum (Ta) metal substrates by pulsed RF magnetron sputtering at a working pressure of 1.5 x10−2 mbar at room temperature are found to display mixed crystalline vanadium oxide phases viz., VO2, V2O3, V2O5. The films have been characterized by field-emission scanning electron microscopy, X-ray diffraction, differential scanning calorimetry (DSC) and X-ray photoelectron spectroscopy, and their thermo-optical and electrical properties have been investigated. Studies of the deposited films by DSC have revealed a reversible-phase transition found in the temperature range of 45–49 °C.

Item Type: Article
Subjects: CHEMISTRY AND MATERIALS > Chemistry and Materials (General)
CHEMISTRY AND MATERIALS > Composite Materials
Depositing User: Mrs SK Pratibha
Date Deposited: 18 Feb 2019 08:38
Last Modified: 18 Feb 2019 08:38
URI: http://nal-ir.nal.res.in/id/eprint/13079

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