TiAlN/TiAlON/Si3N4 tandem absorber for high temperature solar selective applications

Barshilia, Harish C and Selvakumar, N and Rajam, KS and Sridhara Rao, DV and Muraleedharan, K and Biswas, A (2006) TiAlN/TiAlON/Si3N4 tandem absorber for high temperature solar selective applications. Applied Physics Letters, 89 (19). p. 191909.

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Official URL: https://aip.scitation.org/doi/10.1063/1.2387897

Abstract

A tandem absorber of TiAlN∕TiAlON∕Si3N4 is prepared using a magnetron sputtering process. The graded composition of the individual component layers of the tandem absorber produces a film with a refractive index increasing from the surface to the substrate, which exhibits a high absorptance (0.95) and a low emittance (0.07). The tandem absorber is stable in air up to 600°C for 2h, indicating its importance for high temperature solar selective applications. The thermal stability of the tandem absorber is attributed to high oxidation resistance and microstructural stability of the component materials at higher temperatures.

Item Type: Article
Subjects: RENEWABLE ENERGY > Solar Energy
PHYSICS
Depositing User: Dr. Harish C. Barshilia
Date Deposited: 04 Feb 2019 11:21
Last Modified: 04 Feb 2019 11:21
URI: http://nal-ir.nal.res.in/id/eprint/13026

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