Nanostructured alumina films by E-beam evaporation

Neelakanta Reddy, I and Sridhara, N and Bera, Parthasarathi and Anandan, C and Kumar Sharma, A and Dey, A (2015) Nanostructured alumina films by E-beam evaporation. Ceramics International, 41 (9). pp. 10537-10546. ISSN 02728842

Text 10.1016@j.ceramint.2015.04.147.pdf Restricted to Registered users only Download (1MB) | Request a copy

Abstract

The E-beam evaporation technique is utilised at room temperature to deposit 90, 120 and 150 nm thin alumina films on 75 μm thin titanium foils. As-grown films are annealed at 500, 700 and 800 °C in air. The phase analysis, morphology and electronic structure of the as-grown and annealed thin films are respectively investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and X-ray photoelectron spectroscopy (XPS) techniques. The XRD results show that the as-grown thin films are amorphous. The annealed thin films show crystalline peaks corresponding to a mixture of different phases of alumina. The FESEM studies reveal tripod-like nanostructure and dense nanorods in the alumina thin films annealed at 700 and 800 °C, respectively. These results are explained on the basis of experimental evidences provided by the corresponding XPS studies.

Item Type:	Article
Subjects:	ASTRONAUTICS > Astronautics (General) CHEMISTRY AND MATERIALS > Chemistry and Materials (General)
Depositing User:	Mrs SK Pratibha
Date Deposited:	19 Jun 2018 08:56
Last Modified:	19 Jun 2018 08:56
URI:	http://nal-ir.nal.res.in/id/eprint/12807

Actions (login required)

View Item