Microstructural studies of e-beam evaporated alumina thin films

Reddy, IN and Reddy, VR and Dey, A and Sridhara, N and Basavaraja, S and Bera, Parthasarathi and Anandan, C and Sharma, AK (2014) Microstructural studies of e-beam evaporated alumina thin films. Surface Engineering, 30 (8). 594-599. ISSN 1743-2944

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Official URL: http://dx.doi.org/10.1179/1743294414Y.0000000294


Alumina thin films of different thicknesses, e.g. 90, 120 and 150 nm, were grown on SS304 thin foil by electron beam evaporation technique. The films were post-heat treated at 500, 700 and 800°C in air and subsequently characterised by X-ray diffraction, atomic force microscopy, field emission scanning electron microscopy and X-ray photoelectron spectroscopy. The effects of thicknesses and post-heat treatment on microstructure have been studied. The deposited alumina film was almost stoichiometric. The alumina film of the lowest thickness, i.e. 90 nm post-heat treated at 700°C, showed preferential growth of nanorods and irregular polygonal nanostructures with random orientation.

Item Type: Article
Additional Information: Copyright for this article belongs to M/s. Taylor & Francis
Uncontrolled Keywords: Alumina;Thin film;E-beam evaporation;Microstructure;Nanorods
Subjects: AERONAUTICS > Aeronautics (General)
Depositing User: Ms. Alphones Mary
Date Deposited: 02 May 2016 04:09
Last Modified: 02 May 2016 04:09
URI: http://nal-ir.nal.res.in/id/eprint/12461

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