Indigenous development of ultra high vacuum (UHV) magnetron sputtering system for the preparation of permalloy magnetic thin films

Khan, Jakeer and Selvakumar, N and Chowdhury, P and Barshilia, Harish C (2012) Indigenous development of ultra high vacuum (UHV) magnetron sputtering system for the preparation of permalloy magnetic thin films. In: International Symposium on Vacuum Science & Technology and its Application for Accelerators.

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Abstract

We have designed and developed an indigenous ultra high vacuum (UHV) sputtering system which can deposit magnetic thin films with high purity and good uniformity. The equipment consists of state-of the-art technologies and sophistication. Turbo-molecular pump combined with sputter ion pump is used to pump down the vacuum chamber up to 10−10 to 10−11 mbar of pressure. With this system it is possible to deposit coatings of various materials on a sample size of diameter 3". The Ni81Fe19 ferromagnetic thin films, with Tantalum (Ta) as a buffer and cap layers have been deposited on silicon substrates using this ultra high vacuum (UHV) sputtering system. The magneto transport measurement study indicated a significant variation in the AMR values of the films for varying thicknesses of tantalum and NiFe layers.

Item Type:	Conference or Workshop Item (Paper)
Subjects:	PHYSICS
Depositing User:	Dr. Harish C. Barshilia
Date Deposited:	16 Oct 2015 04:28
Last Modified:	16 Oct 2015 04:28
URI:	http://nal-ir.nal.res.in/id/eprint/12370

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