Ghosh, SK and Chowdhury, P and Dogra, A (2013) Magnetic and magnetoresistance studies of the evolution of the magnetic layer structure with Co layer thickness in electrodeposited Co–Cu/Cu multilayers. Journal of Magnetism and Magnetic Materials, 327. pp. 121-124. ISSN 0304-8853
Full text not available from this repository. (Request a copy)Abstract
The structural transformation of electrochemically deposited Co–Cu/Cu multilayers with magnetic layer thickness was monitored via measurements of magnetization and magnetoresistance. For this, electrodeposition of [Co (tCo nm)/Cu (4 nm)]50 multilayers were carried out by varying the Co-layer thickness (tCo) down to 0.2 nm from a sulfate based single solution electrolyte. Magnetization measurements showed the appearance of anisotropy, increase in remanence magnetization and coercivity with systematic increase of tCo from 0.2 to 1 nm. Magnetic field direction dependent magnetoresistance (MR) measurements revealed that the isotropy in MR changes with tCo from tridimensional at 0.2 nm to in-plane at 0.4 nm to fully anisotropic at 1.0 nm. This illustrated that a fully granular magnetic Co-layer structure (tCo=0.2 nm) transforms into discontinuous layered one (tCo=0.4 nm) due to coalescence of suparparamagnetic regions to a continuous ferromagnetic layer (tCo=1 nm).
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | GMR;CoCu/Cu multilayers;Electrodeposition; Superparamagnetism |
| Subjects: | AERONAUTICS > Aeronautics (General) ENGINEERING > Electronics and Electrical Engineering |
| Depositing User: | Ms. Alphones Mary |
| Date Deposited: | 02 Apr 2013 05:15 |
| Last Modified: | 02 Apr 2013 05:15 |
| URI: | http://nal-ir.nal.res.in/id/eprint/11560 |
Actions (login required)
 |
View Item |
