Indigenous development of ultra high vacuum (UHV) magnetron sputtering system for the preparation of Permalloy magnetic thin films

Jakeer, Khan and Selvakumar, N and Chowdhury, P and Barshilia, Harish C (2012) Indigenous development of ultra high vacuum (UHV) magnetron sputtering system for the preparation of Permalloy magnetic thin films. In: International Symposium on Vacuum Science & Technology and its Application for Accelerators, February 15-17, 2012, Kolkata.

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Abstract

We have designed and developed an indigenous ultra high vacuum (UHV) sputtering system which can deposit magnetic thin films with high purity and good uniformity. The equipment consists of state-of the-art technologies and sophistication. With this system it is possible to deposit coatings of various materials on a sample size of 3”3” 3”. The Ni81Fe19 ferromagnetic thin films, with Tantalum (Ta) as a buffer and cap layers have been deposited on silicon substrates using this ultra high vacuum (UHV) sputtering system. The magneto transport measurement study indicated a significant variation in the AMR values of the films for varying thicknesses of tantalum and NiFe layers.

Item Type: Conference or Workshop Item (Poster)
Subjects: PHYSICS > Plasma Physics
Depositing User: Mr N Selvakumar
Date Deposited: 23 Jan 2013 05:41
Last Modified: 10 Aug 2015 05:44
URI: http://nal-ir.nal.res.in/id/eprint/11447

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