Growth and characterization of nanolayered TiN/CrN multilayer coatings

Barshilia, Harish C and Rajam, KS (2003) Growth and characterization of nanolayered TiN/CrN multilayer coatings. In: National Symposium on Vacuum Science and Vacuum Metallurgy, 15-17 Oct 2003, Mumbai.

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Abstract

Nanolayered TiN/CrN multilayers were deposited on silicon substrates using a reactive DC magnetron sputtering process. The structural and mechanical properties of the coatings were studied using X-ray diffraction (XRD) and nanoindentation respectively. Effects of nitrogen flow rate (N2), substrate bias (VB), substrate temperature (TS) and modulation wavelength () on the structure and the hardness of the coatings were studied. A nitrogen flow rate of 2.0 sccm, a substrate bias of -150 V and a substrate temperature of 400°C resulted in TiN/CrN coatings with {111} texture. Further, under these deposition conditions the coatings displayed superlattice structure for 40 Å    130 Å, and at  = 80 Å the coatings exhibited a maximum hardness of 3800 kg/mm2. Keywords: TiN/CrN multilayers; Reactive magnetron sputtering; X-ray diffraction; Nanoindentation

Item Type: Conference or Workshop Item (Paper)
Subjects: PHYSICS > Physics(General)
Division/Department: Surface Engineering Division, Surface Engineering Division
Depositing User: Mr N Selvakumar
Date Deposited: 24 Aug 2011 14:33
Last Modified: 19 Sep 2011 11:48
URI: http://nal-ir.nal.res.in/id/eprint/9862

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