Barshilia, Harish C and Rajam, KS (2003) Growth and characterization of nanolayered TiN/CrN multilayer coatings. In: National Symposium on Vacuum Science and Vacuum Metallurgy, 15-17 Oct 2003, Mumbai.
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Nanolayered TiN/CrN multilayers were deposited on silicon substrates using a reactive DC magnetron sputtering process. The structural and mechanical properties of the coatings were studied using X-ray diffraction (XRD) and nanoindentation respectively. Effects of nitrogen flow rate (N2), substrate bias (VB), substrate temperature (TS) and modulation wavelength () on the structure and the hardness of the coatings were studied. A nitrogen flow rate of 2.0 sccm, a substrate bias of -150 V and a substrate temperature of 400°C resulted in TiN/CrN coatings with {111} texture. Further, under these deposition conditions the coatings displayed superlattice structure for 40 Å 130 Å, and at = 80 Å the coatings exhibited a maximum hardness of 3800 kg/mm2. Keywords: TiN/CrN multilayers; Reactive magnetron sputtering; X-ray diffraction; Nanoindentation
| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| Subjects: | PHYSICS > Physics(General) |
| Division/Department: | Surface Engineering Division, Surface Engineering Division |
| Depositing User: | Mr N Selvakumar |
| Date Deposited: | 24 Aug 2011 14:33 |
| Last Modified: | 19 Sep 2011 11:48 |
| URI: | http://nal-ir.nal.res.in/id/eprint/9862 |
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