Growth of nanostructured TiN/NbN superlattice coatings by DC reactive sputtering process

Barshilia, Harish C and Rajam, KS (2004) Growth of nanostructured TiN/NbN superlattice coatings by DC reactive sputtering process. In: Inorganic Materials: Recent Advances. Narosa Publishing House, p. 427.

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Abstract

Single layer TiN and NbN coatings were deposited on Si (111) and tool steel substrates using a reactive DC magnetron sputtering process. Process parameters were controlled in such a way that cubic phases of TiN and NbN with B1 structure were formed. Subsequently, TiN/NbN multilayer coatings were deposited at various modulation wavelengths (), that is the bilayer thicknesses. X-ray diffraction (XRD), nanoindentation and atomic force microscopy (AFM) were used to characterize the coatings. Multilayer coatings deposited at 120 Å >  > 25 Å showed satellite reflections along (111) principal reflection, thus confirming the formation of superlattice structure. The multilayer coatings exhibited hardness as high as ~4000 kg/mm2, which was about 2 times the rule-of-mixtures value. The AFM images showed that the coatings had a roughness of ~5 nm.

Item Type: Book Section
Subjects: CHEMISTRY AND MATERIALS > Chemistry and Materials (General)
Depositing User: Mr N Selvakumar
Date Deposited: 29 Aug 2011 05:25
Last Modified: 19 Sep 2011 06:15
URI: http://nal-ir.nal.res.in/id/eprint/9823

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