TiAlN/TiAlON/Si3N4 tandem absorber for high temperature solar selective applications

Barshilia, Harish C and Selvakumar, N and Rajam, KS and Sridhara Rao, DV and Muraleedharan, K and Biswas, A (2006) TiAlN/TiAlON/Si3N4 tandem absorber for high temperature solar selective applications. Applied Physics Letters, 89 (191909). ISSN 0003-6951

Full text available as:
[img] PDF (Journal) - Published Version
Restricted to Registered users only

Download (131Kb) | Request a copy

    Abstract

    A new tandem absorber of TiAlN/TiAlON/Si3N4 is prepared using a magnetron sputtering process. The graded composition of the individual component layers of the tandem absorber produces a film with a refractive index increasing from surface to the substrate, which exhibits a high absorptance (0.95) and a low emittance (0.07). The tandem absorber is stable in air up to 600C for 2 hrs, indicating its importance for high temperature solar selective applications. The thermal stability of the tandem absorber is attributed to high oxidation resistance and microstructural stability of the component materials at higher temperatures.

    Item Type: Journal Article
    Subjects: RENEWABLE ENERGY > Solar Energy
    PHYSICS > Optics
    Division/Department: Surface Engineering Division, Surface Engineering Division, Surface Engineering Division, Other, Other, Other
    Depositing User: Mr N Selvakumar
    Date Deposited: 27 Jul 2011 11:16
    Last Modified: 27 Jul 2011 11:16
    URI: http://nal-ir.nal.res.in/id/eprint/9659

    Actions (login required)

    View Item