TiAlN/TiAlON/Si3N4 tandem absorber for high temperature solar selective applications

Barshilia, Harish C and Selvakumar, N and Rajam, KS and Sridhara Rao, DV and Muraleedharan, K and Biswas, A (2006) TiAlN/TiAlON/Si3N4 tandem absorber for high temperature solar selective applications. Applied Physics Letters, 89 (191909). ISSN 0003-6951

[img] PDF (Journal)
APL_paper.pdf - Published Version
Restricted to Registered users only

Download (134kB) | Request a copy
Official URL: http://link.aip.org/link/APPLAB/v89/i19/p191909/s1...

Abstract

A new tandem absorber of TiAlN/TiAlON/Si3N4 is prepared using a magnetron sputtering process. The graded composition of the individual component layers of the tandem absorber produces a film with a refractive index increasing from surface to the substrate, which exhibits a high absorptance (0.95) and a low emittance (0.07). The tandem absorber is stable in air up to 600C for 2 hrs, indicating its importance for high temperature solar selective applications. The thermal stability of the tandem absorber is attributed to high oxidation resistance and microstructural stability of the component materials at higher temperatures.

Item Type: Article
Subjects: RENEWABLE ENERGY > Solar Energy
PHYSICS > Optics
Depositing User: Mr N Selvakumar
Date Deposited: 27 Jul 2011 05:46
Last Modified: 27 Jul 2011 05:46
URI: http://nal-ir.nal.res.in/id/eprint/9659

Actions (login required)

View Item View Item