Dasannacharya, BS (1989) Photoetched double spiral device. Technical Report. National Aeronautical Laboratory, Bangalore, India.
Full text not available from this repository.Abstract
The computer graphic generation of a master drawing of a double spiral design is described along with the mask fabrication and the fabrication of the end product, the free filament resistance element of a 200 micron Manganin (Cu, Ni, Mn) foil. A listing of a program for generation of concentric circles is also listed. (Author)
| Item Type: | Proj.Doc/Technical Report (Technical Report) |
|---|---|
| Uncontrolled Keywords: | Computer graphics;Computer programs;Etching;Photochemical reactions;Photplithography;Engineering drawings;Drawings;Metal foils;Spirals |
| Subjects: | MATHEMATICAL AND COMPUTER SCIENCES > Computer Programming and Software |
| Division/Department: | Systems Engineering Division |
| Depositing User: | M/S ICAST NAL |
| Date Deposited: | 23 Apr 2008 |
| Last Modified: | 24 May 2010 09:55 |
| URI: | http://nal-ir.nal.res.in/id/eprint/4428 |
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