Photoetched double spiral device

Dasannacharya, BS (1989) Photoetched double spiral device. Technical Report. National Aeronautical Laboratory, Bangalore, India.

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The computer graphic generation of a master drawing of a double spiral design is described along with the mask fabrication and the fabrication of the end product, the free filament resistance element of a 200 micron Manganin (Cu, Ni, Mn) foil. A listing of a program for generation of concentric circles is also listed. (Author)

Item Type: Proj.Doc/Technical Report (Technical Report)
Uncontrolled Keywords: Computer graphics;Computer programs;Etching;Photochemical reactions;Photplithography;Engineering drawings;Drawings;Metal foils;Spirals
Subjects: MATHEMATICAL AND COMPUTER SCIENCES > Computer Programming and Software
Division/Department: Systems Engineering Division
Depositing User: M/S ICAST NAL
Date Deposited: 23 Apr 2008
Last Modified: 24 May 2010 09:55

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