Photoetched double spiral device

Dasannacharya, BS (1989) Photoetched double spiral device. Technical Report. National Aeronautical Laboratory, Bangalore, India.

Full text not available from this repository.

Abstract

The computer graphic generation of a master drawing of a double spiral design is described along with the mask fabrication and the fabrication of the end product, the free filament resistance element of a 200 micron Manganin (Cu, Ni, Mn) foil. A listing of a program for generation of concentric circles is also listed. (Author)

Item Type: Proj.Doc/Technical Report (Technical Report)
Uncontrolled Keywords: Computer graphics;Computer programs;Etching;Photochemical reactions;Photplithography;Engineering drawings;Drawings;Metal foils;Spirals
Subjects: MATHEMATICAL AND COMPUTER SCIENCES > Computer Programming and Software
Division/Department: Systems Engineering Division
Depositing User: M/S ICAST NAL
Date Deposited: 23 Apr 2008
Last Modified: 24 May 2010 09:55
URI: http://nal-ir.nal.res.in/id/eprint/4428

Actions (login required)

View Item