Measurement of thickness of thin films by the x-ray diffraction method

Srinivasan, C and Balasingh, C and Singh, AK (1979) Measurement of thickness of thin films by the x-ray diffraction method. Technical Report. National Aeronautical Laboratory, Bangalore, India.

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    Abstract

    X-ray diffraction method can be used to measure the thickness of thin films (coatings). The principle and the experimental details of the x-ray diffraction methods are described. The intensities of the diffracted beams are derived assuming a random orientation of the crystallites in the diffracting medium. Consequently, the expressions are not valid when the sample has preferred orientation. To check the performance of the method, thicknesses of nickel deposits on mild steel plates were determined by the x-ray diffraction method and the results compared with those obtained by the weighing method and metallographic examination. The weighing method which gives an accuracy of xB1;0.1 micron is taken as the standard. The x-ray diffraction methods and the metallographic examinations give values13; within xB1;1 m1cron Of the value obtained by the weighing method.

    Item Type: Proj.Doc/Technical Report (Technical Report)
    Uncontrolled Keywords: Thin films;X-ray diffraction method;Crystallites
    Subjects: CHEMISTRY AND MATERIALS > Composite Materials
    CHEMISTRY AND MATERIALS > Metals and Metallic Materials
    Division/Department: Materials Science Division, Materials Science Division, Materials Science Division
    Depositing User: M/S ICAST NAL
    Date Deposited: 04 Jan 2007
    Last Modified: 24 May 2010 09:54
    URI: http://nal-ir.nal.res.in/id/eprint/3832

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