Electrical resistivity studies on acid-treated E-glass fabric

Ramachandran, BE and Pai, BC and Balasubramanian, N (1979) Electrical resistivity studies on acid-treated E-glass fabric. Journal of Materials Science, 14 . pp. 1572-1578. ISSN 0022-2461

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    Abstract

    E-glass fabrics are soaked in different normalities of HCl for different time intervals to remove nonsiliceous ions from the network. The effect of selective removal of nonsiliceous ions on volume (electrical) resistivity is studied along with the independent effects of normality of the soaking acid and time of soaking. Also studied are the effect of moisture absorption on electrical resistivity, the effect of post-heat-treatment on electrical resistivity and subsequent moisture absorption on electrical resistivity, correlating the existing mechanisms of electrical conduction in glasses. The amount of nonsiliceous ions removed depends on the normality of the acid and the soaking time. The influence of Na2O and K2O removal on the electrical resistivity is more prominent than the removal of bivalent and trivalent ions such as CaO and Al2O3. Increase in the post-heat-treatment temperature of the fabric increases the electrical resistivity. Porosity occurs in the structure. Increase in the conductivity by water absorption can be explained by polarization of the absorbed water and formation of protons, which act as conducting species.

    Item Type: Journal Article
    Additional Information: Copyright for this article belongs to Kluwer Academic Publishers Group
    Uncontrolled Keywords: Chemical effects;Electrical resistivity;Glass fibers;Heat treatment;Moisture content;Temperature effects;Hydrochloric acid;Material absorption;Porosity;Potassium oxides;Sodium compounds;Time dependence
    Subjects: CHEMISTRY AND MATERIALS > Nonmetallic Materials
    Division/Department: Materials Science Division, Materials Science Division, Materials Science Division
    Depositing User: Ms. Alphones Mary
    Date Deposited: 13 Jun 2006
    Last Modified: 24 May 2010 09:42
    URI: http://nal-ir.nal.res.in/id/eprint/1483

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