A Raman-scattering study on the interface structure of nanolayered TiAlN/TiN and TiN/NbN multilayer thin films grown by reactive dc magnetron sputtering

Barshilia, Harish C and Rajam, KS (2005) A Raman-scattering study on the interface structure of nanolayered TiAlN/TiN and TiN/NbN multilayer thin films grown by reactive dc magnetron sputtering. Journal of Applied Physics, 98 (1). 014311-1.

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Abstract

Nanolayered multilayer coatings of TiAlN/TiN and TiN/NbN were deposited on Si (100) substrates at various modulation wavelengths (i.e., bilayer thickness,A) using a reactive dc magnetron sputtering system. These coatings were characterized using micro-Raman spectroscopy to study the effect of interfaces on the optical-phonon modes. For TiAlN/TiN multilayers, the optical-phonon band shifts to higher frequencies with a decrease in the modulation wavelength. Furthermore, the optical-phonon band shifts to higher frequencies with an increase in the substrate13; temperature for TiAlN/TiN multilayers deposited at A=80 xC5;. No such shift was observed for single-layer TiN and TiN/NbN multilayer coatings. This observed shift has been attributed to interdiffusion between the layers during deposition, which is more for TiAlN/TiN multilayers as13; compared to TiN/NbN multilayers. The x-ray-diffraction data showed well-defined satellite reflections for TiN/NbN multilayers at low modulation wavelengths and very weak satellite reflections for TiAlN/TiN multilayers, indicating that interfaces were very broad for TiAlN/TiN13; multilayers. The nanoindentation data showed no significant improvement in the hardness of13; TiAlN/TiN multilayers as compared to the rule-of-mixture value, whereas TiN/NbN multilayers showed an improvement in the hardness, which was two times the rule-of-mixture value. The low hardness of TiAlN/TiN multilayers has been attributed to interfacial diffusion. xA9; 2005 American13; Institute of Physics. (DOI: 10.1063/1.1946193)

Item Type: Article
Uncontrolled Keywords: A.Raman spectra;TiAlN/TiN;TiN/NbN multilayers
Subjects: CHEMISTRY AND MATERIALS > Inorganic, Organic and Physical Chemistry
PHYSICS > Physics(General)
ENGINEERING > Engineering (General)
Depositing User: Users 49 not found.
Date Deposited: 12 May 2006
Last Modified: 24 May 2010 04:11
URI: http://nal-ir.nal.res.in/id/eprint/1401

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