Structure, hardness and thermal stability of TiAlN and nanolayered TiAlN/CrN multilayer films

Barshilia, Harish C and Surya Prakash, M and Jain, Anjana and Rajam, KS (2005) Structure, hardness and thermal stability of TiAlN and nanolayered TiAlN/CrN multilayer films. Vacuum, 77. pp. 169-179.

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Abstract

TiAlN films were deposited on silicon (1 1 1) substrates from a TiAl target using a reactive DC magnetron sputtering13; process in Ar+N2 plasma. Films were prepared at various nitrogen flow rates and TiAl target compositions. Similarly, CrN films were prepared from the reactive sputtering of Cr target. Subsequently, nanolayered TiAlN/CrN multilayer films were deposited at various modulation wavelengths (L). X-ray diffraction (XRD), energy dispersive X-ray analysis, nanoindentation and atomic force microscopy were used to characterize the films. The XRD confirmed the formation of superlattice structure at low modulation wavelengths. The maximum hardness of TiAlN/CrN multilayers was 3900 kg/mm2, whereas TiAlN and CrN films exhibited maximum hardnesses of 3850 and 1000 kg/mm2 , respectively. Thermal stability of TiAlN and TiAlN/CrN multilayer films was studied by heating the films in air in the temperature range (TA) of 500x2013;900 xB0;C for 30 min. The XRD spectra revealed that TiAlN/CrN multilayers were stable up to 800 xB0;C and got oxidized substantially at 900 'C. On the other hand, the TiAlN films were stable up to 700 'C and got completely oxidized at 800 xB0;C. Nanoindentation measurements performed on the films after heat treatment showed that TiAlN retained a hardness of 2200 kg/mm2 at TA=700 xB0;C and TiAlN/CrN multilayers retained hardness as high as 2600 kg/mm2 upon annealing at 800'C.

Item Type: Article
Additional Information: Copyright belongs to Elsevier
Uncontrolled Keywords: TiAlN films;TiAlN/CrN multilayers;Reactive DC magnetron sputtering;X-ray diffraction;Nanoindentation;Thermal13; stability
Subjects: CHEMISTRY AND MATERIALS > Chemistry and Materials (General)
Depositing User: Users 20 not found.
Date Deposited: 11 May 2006
Last Modified: 13 Oct 2015 07:04
URI: http://nal-ir.nal.res.in/id/eprint/1392

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