Corrosion behaviour of sputtered alumina thin films

Reddy, IN and Dey, Arjun and Sridhara, N and Anoop, S and Rani, RU and Sharma, AK and Bera, Parthasarathi and Anandan, C (2015) Corrosion behaviour of sputtered alumina thin films. Journal of Institute of Engineers Series D, 96 (2). pp. 105-112. ISSN 2250-2130

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    Abstract

    Corrosion behaviour of sputtered alumina thin films Abstract: Corrosion studies of sputtered alumina thin films grown on stainless steel (SS) 304 were carried out by linear polarization and electrochemical impedance spectroscopy. Noticeable changes were not observed in morphology and surface roughness of films after the corrosion studies investigated by field emission scanning electron microscopy and atomic force microscopy. Corrosion current density (icorr) of alumina coated SS decreased up to 10-10 A.cm-2 while icorr value in the range of 10-5-10-6 A.cm-2 was observed for bare SS. The direct sputtered film showed superior corrosion resistance behaviour than the reactive sputtered film. This might be link with the difference in thickness of the films sputtered by direct and reactive methods. The electronic structure of deposited alumina films was studied both before and after corrosion test by X-ray photoelectron spectroscopy technique which also confirmed no structural changes of alumina film after exposing corrosive environment.

    Item Type: Journal Article
    Additional Information: Copyright for this article belongs to M/s. Springer
    Uncontrolled Keywords: Alumina;Thin film;rf magnetron sputtering;Linear polarization;Electrochemical impedance spectroscopy; Microstructure
    Subjects: CHEMISTRY AND MATERIALS > Chemistry and Materials (General)
    Division/Department: Other, Other, Other, Other, Other, Other, Surface Engineering Division, Surface Engineering Division
    Depositing User: Ms. Alphones Mary
    Date Deposited: 02 May 2016 09:40
    Last Modified: 02 May 2016 09:40
    URI: http://nal-ir.nal.res.in/id/eprint/12462

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