Nanoindentation response of ITO film

Pradeepkumar, MS and Sibin, K P and Swain, Niharika and Sridhara, N and Dey, Arjun and Barshilia, Harish C and Sharma, AK (2015) Nanoindentation response of ITO film. Ceramics International, 41 (6). pp. 8223-8229. ISSN 0272-8842

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    We report nanoindentation response of indium tin oxide (ITO) film deposited by reactive direct current (DC) magnetron sputtering. The phase pure ITO film showed dense and needle-like nanostructure. Detailed mechanical characterization of ITO film was carried out by the nanoindentation technique. The average nanohardness and elastic modulus were evaluated as about 17.5 GPa and 189 GPa, respectively. Comparatively higher nanohardness and modulus values were found in the present work, which is possibly linked with the dense nanostructure of the ITO film. Further, fracture toughness was measured as ~0.56 MPa.m0.5. The corresponding projected area of indentation, elastic energy and plastic energy were also reported.

    Item Type: Journal Article
    Additional Information: Copyright for this article belongs to M/s. ELSEVIER
    Uncontrolled Keywords: Indium tin oxide;Nanoindentation;Nanohardness;Elastic modulus;Fracture toughness;Nanostructure
    Subjects: CHEMISTRY AND MATERIALS > Chemistry and Materials (General)
    Division/Department: Other, Surface Engineering Division, Surface Engineering Division, Other, Other, Surface Engineering Division, Other
    Depositing User: Ms. Alphones Mary
    Date Deposited: 02 Nov 2015 14:07
    Last Modified: 02 Nov 2015 14:07

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