Development of superhard nanocomposite coatings by unbalanced magnetron sputtering process

Deepthi, B (2005) Development of superhard nanocomposite coatings by unbalanced magnetron sputtering process. Technical Report. National Aerospace Laboratories, Bangalore.

Full text available as:
[img] PDF
Restricted to Archive staff only

Download (243Kb)

    Abstract

    This project involves the deposition of superhard nanocomposite coatings of TiN/Si3N4 using unbalanced magnetron sputtering system equipped with ion beam assisted facility. Unbalanced magnetron sputtering combined with pulsed dc power supply is a powerful tool for the deposition of compound thin films. The coatings were deposited on silicon substrates under high vacuum conditions. TiN/Si3N4 films were deposited at different silicon concentrations and bias voltages. X-ray diffraction results confirmed the nanocrystalline nature of the coatings. NHT measurements showed that the nanocomposite coating had high hardness values. The surface morphology of the TiN/Si3N4 coating was studied using AFM.

    Item Type: Proj.Doc/Technical Report (Technical Report)
    Uncontrolled Keywords: Sputtering;Unbalanced magnetron;Ion-assisted deposition;Superhard coatings
    Subjects: CHEMISTRY AND MATERIALS > Composite Materials
    CHEMISTRY AND MATERIALS > Space Processing
    Division/Department: Surface Engineering Division
    Depositing User: Ms Indrani V
    Date Deposited: 16 Jan 2009
    Last Modified: 24 May 2010 09:40
    URI: http://nal-ir.nal.res.in/id/eprint/1129

    Actions (login required)

    View Item