Elemental Distribution Characteristics Across γ-TiAl:TiAlV Diffusion Bond Interface

Sivagnanapalani, P and Gouthama, - and Sujata, M (2012) Elemental Distribution Characteristics Across γ-TiAl:TiAlV Diffusion Bond Interface. Materials Science Forum, 702-70. pp. 718-721.

[img] PDF
Sujata_DB_MSF.pdf - Published Version
Restricted to Registered users only

Download (1MB) | Request a copy

Abstract

In the present study diffusion bonding of γ-TiAl intermetallic with Ti-6Al-4V alloy was carried out in high vacuum. The diffusion bonding was performed at temperatures of 800°C and 850°C under the constant pressure of 40MPa and at varying time. The interfacial microstructure formed during the diffusion bonding was analysed by SEM and TEM. The elemental distribution characteristics across the interface were also studied by X-ray EDS analysis. From EDS results obtained, some regions were rich in aluminium and some regions were rich in vanadium. Also there are some compositional variations such as chromium and niobium close to the interface zone. However, the composition gradient was not gradual across the interface. Strong evidence has been found for the solute re-distribution in a more localized manner.

Item Type: Article
Uncontrolled Keywords: Diffusion bonding, Titanium aluminides, Interface, SEM-EDS, TEM-EDS
Subjects: CHEMISTRY AND MATERIALS > Chemistry and Materials (General)
Depositing User: Users 10 not found.
Date Deposited: 10 Oct 2012 08:00
Last Modified: 10 Oct 2012 08:00
URI: http://nal-ir.nal.res.in/id/eprint/11059

Actions (login required)

View Item View Item